MuWells Inc
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San Diego, California, US
MuWells is an innovation-driven company with expertise in creating solutions for biological research and biotechnology, merging the latest advances in cell biology, microfluidics, and bioengineering.
MuWells offers microfabrication services using UV photolithography, laser cutting, casting in PDMS, hard... Show more »
MuWells is an innovation-driven company with expertise in creating solutions for biological research and biotechnology, merging the latest advances in cell biology, microfluidics, and bioengineering.
MuWells offers microfabrication services using UV photolithography, laser cutting, casting in PDMS, hard plastics, and hydrogels, hot embossing, and lamination.
Publications
- Erickstad, M., Gutierrez, E., and Groisman, A., A low-cost low-maintenance ultraviolet lithography light source based on light-emitting diodes. Lab on a Chip 15, 57-61 (2015)
- Campbell, K., Levi, U., Fainman, Y., and Groisman, A., Pressure-driven devices with lithographically fabricated composite epoxy-elastomer membranes, Appl. Phys. Lett. 89, Art. #154105 (2006)
- Tkachenko, E., Gutierrez, E., Ginsberg, M., and Groisman, A. An easy to assemble microfluidic perfusion device with a magnetic clamp. Lab on a Chip 9, 1085-1095 (2009)
- Carvalho, A., Olson, S.K., Gutierrez, E., Zhang, K., Noble, L.B., Zanin, E., Desai, A., Groisman, A., and Oegema, K. Accute drug treatment in early C. elegans embryos, PLoS One 6, e24656 (2011)
- Razooky, B.S., Gutierrez, E., Terry, V.H., Spina, C.A., Groisman, A., and Weinberger, L.S., Microwell devices with finger-like channels for long-term imaging of HIV-1 expression kinetics in primary human lymphocytes, Lab on a Chip 12, 4305–4312 (2012)
- Vertelov, G., Gutierrez, E., Lee, S.-A., Ronan, E., Groisman, A., & Tkachenko, E. Rigidity of silicone substrates controls cell spreading and stem cell differentiation. Scientific Reports, 6, 33411 (2016)
Our photolithography system for 5 inch wafers is based on a 365 nm (i-line) LED flood source of collimated UV light with an intensity of ~10 mW/cm2, divergence of ~4.5° (full width at half height), and uniformity of ~10% (peak-to-peak variation) over an 90x90 mm square. The system is built for SU8 photoresists with thicknesses of... Show more »
Our photolithography system for 5 inch wafers is based on a 365 nm (i-line) LED flood source of collimated UV light with an intensity of ~10 mW/cm2, divergence of ~4.5° (full width at half height), and uniformity of ~10% (peak-to-peak variation) over an 90x90 mm square. The system is built for SU8 photoresists with thicknesses of up to 1 mm, but can also be used with other i-line resists. A mask aligner enables lithography with up to three layers of SU8. We can also produce wafers with SU8 micro-reliefs with draft angles in a range from 3 to 9°. Such wafers can be used to make injection molds for plastics, with the draft angles facilitating demolding.
Our additional services related to microfabrication include assisting with the photomask design, ordering chrome masks, wafer dicing, and casting PDMS replicas, which can be further processed by cutting them into separate chips and punching holes in the chips for making microfluidic devices
Our additional services related to microfabrication include assisting with the photomask design, ordering chrome masks, wafer dicing, and casting PDMS replicas, which can be further processed by cutting them into separate chips and punching holes in the chips for making microfluidic devices
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