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ANFF - New South Wales Node

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Sydney, New South Wales, AU

About ANFF - New South Wales Node

The NSW Node of ANFF is based at the University of New South Wales, operating within a 600m2 laboratory complex providing cleanrooms with particle counts equivalent to ISO5, ISO6 and ISO7.

The core area of expertise for ANFF-NSW is nanoelectronics, with both Si-MOS and GaAs devices with sub-50nm feature sizes routinely produced using the Node’s suite of high resolution EBL systems. The full range of research disciplines regularly supported by ANFF-NSW is broad, encompassing quantum computing, biomedical devices, nanophotonics, medical detectors and photovoltaics.
ANFF-NSW also has a strong process engineering team available to develop and deliver one-on-one nanofabrication training programs to suit researchers’ needs, and to perform process development work on behalf of researchers.

Specialist fields:

  • nanoelectronics
  • high resolution electron-beam lithography
  • nanoelectronics (Si MOS and GaAs)
  • semiconductor device processing

Our Services (18)


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Atomic Layer Deposition (ALD)

Atomic layer deposition
Price on request

A CNT Savannah S200 atomic layer deposition system is available for the deposition of Al2O3 and HfO2.


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Project Management

Starting at A$150.00 per hour

ANFF can provide consulting services to perform contract research or process engineering in the area of micro, nano and advanced materials fabrication to deliver prototypes or documented processes. Projects can be managed across each of the eight nodes of ANFF drawing on the resources of over 90 technical staff, 500 facilities and a network of academics.


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Device Packaging

Price on request

The NSW Node has a range of packaging tools for semiconductor devices.


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Electron Beam Evaporation

Price on request

Two Edwards evaporator systems are available for the deposition of both MOS compatible and other non-MOS compatible materials.


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Electron Beam Lithography (EBL)

Price on request

ANFF - NSW has three high resolution EBL systems, including a Raith 150TWO system, as well as all processing equipment and dedicated technical staff.


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Photolithography

Price on request

The NSW Node has a suite of UV lithography tools including three mask aligners and all necessary processing tools.


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Plasma-Enhanced Chemical Vapor Deposition

Price on request

A PECVD system is available for depositing amorphous Si or Si3N4.

Gases available include: Ar, O2, SF6, CHF3.


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Reactive Ion Etching

Price on request

The NSW Node has three reactive ion etchers, including a hollow cathode RIE, and inductively coupled plasma (ICP-RIE) for deep reactive ion etching using the Bosch process.

Gasses available include:
O2, SF6, CF4, Ar, SiH4, PH5, BH3, GeH4 , PH3, CH4, B2H6


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Sputtering

Price on request

Two RF sputtering systems are available for the deposition of a range of materials.


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Thermal Evaporation

Price on request

Two thermal evaporator systems are available for the directional deposition of a range of metals.


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Engineering and Fabrication

Price on request
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Chemical Vapor Deposition Services

Price on request
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Deposition

Price on request
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Etching

Price on request
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Lithography

Price on request
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Microfabrication Services

Price on request
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Device Development

Price on request
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Fabrication and Materials Processing Services

Price on request
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